In addition to using the highest quality graphite materials in the world, Hongfeng Carbon Solutions has over two decades of experience providing critical components for the semiconductor industry including ion-implantation, etching, chemical vapor deposition (CVD), and more.
Ion-beam technologies, such as ion implantation for semiconductor doping and ion source grids for particle acceleration, require materials that withstand high-energy ion bombardment while minimizing contamination, erosion, and particle release. Traditional high-purity graphite offers cost-effective thermal management, while enhancements like our
VitreSeal™ vitreous impregnation reduce outgassing and particle emissions, and better resist beam erosion.
This results in a yield boost across equipment cycles.The images
below show a comparison between two apertures following identical OEM-defined equipment cycles.
Learn more about VitreSeal.